Samsung Electronics, ASML expand High NA EUV lithography collaboration
Reuters2026/09/08 06:18- Samsung Electronics expanded its strategic partnership with ASML to deepen collaboration on High NA EUV lithography for next-generation chip manufacturing.
- Samsung will join an industry initiative to develop a 12-inch photomask platform for High NA EUV, targeting higher productivity and lower costs.
- Plans call for introducing ASML’s High NA EUV into future DRAM high-volume manufacturing by 2028, a first for the industry.
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